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Smoltek has been awarded another patent for improving capacitor density
Smoltek has been awarded another patent in the Multilayer Cap patent family. The innovation in this patent family introduces a MIM-capacitor device that can double or triple the capacitance density of our CNF-MIM capacitors.
January 21, 2025
The Multilayer Cap patent family details an invention for a layered energy storage device, specifically a capacitor, built using a metal-insulator-metal (MIM) configuration.
This is the second granted patent in this family and the innovation discloses a CNF (carbon nanofiber) based multilayer MIM structure in which electrodes and dielectrics are deposited one after another. This is a technique that has potential to greatly increase the capacitance density and hence is considered important for Smoltek business and technology.
Capacitance density is a key performance indicator of our CNF-MIM capacitor technology. In this patent family, we introduce an innovative multi-layer structure that can double or triple the capacitance density.
Farzan Ghavanini, CTO at Smoltek.
The Multilayer Cap patent application includes two independent claims: A device claim, that describes the stacked multilayer capacitor structure having alternating conductor-insulator layers. And a method claim, describing the fabrication of such device with conformal coating on the CNFs.
Smoltek’s patent portfolio now globally comprises 93 granted patents. Read more about our IP and patents.
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