CNF-MIM Technology, Enabling the Worlds Thinnest Capacitor

This paper will present a nov­el tech­nol­o­gy (CNF-MIM) com­bin­ing Car­bon Nanofiber (CNF) mate­ri­als and MIM (metal-insulator-metal)-like tech­nol­o­gy, enabling capac­i­tors with total thick­ness low­er than 40 µm suit­able for use in future minia­tur­ized electronics.

The ultra-thin and dis­crete CNF-MIM capac­i­tors have been man­u­fac­tured and char­ac­ter­ized on sev­er­al sub­strates, show­ing excel­lent elec­tri­cal prop­er­ties such as high capac­i­tance den­si­ty of sev­er­al hun­dreds of nF/​mm2, ESR (equiv­a­lent series resis­tance) in the mOhm range, low ESL (equiv­a­lent series induc­tance) on the order of 10 pH thus being promis­ing for a mul­ti­tude of appli­ca­tions with­in the semi­con­duc­tor indus­try. To assess the long-term dura­bil­i­ty, CNF-MIM capac­i­tors have also been sub­ject­ed to pro­longed expo­sure to high tem­per­a­ture and con­stant volt­age bias envi­ron­ments fol­low­ing a HTS (high tem­per­a­ture stor­age) and BTS (biased tem­per­a­ture stress) stan­dard. The CNF-MIM capac­i­tor show ini­tial robust­ness against degra­da­tion in these scenarios. 

The paper was pre­sent­ed by Maria Bylund, Smoltek AB, Gothen­burg, Swe­den at the 3rd PCNS 7–10th Sep­tem­ber 2021, Milano, Italy as paper No.5.3. and vot­ed by atten­dees as: BEST PAPER AWARD.