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The Catalyst Diffusion family is covering a method for manufacturing a plurality of nanostructures on a substrate.
The invention: Nanostructure device and method for manufacturing nanostructures – A method for manufacturing a plurality of nanostructures on a substrate. The method comprises the steps of: depositing a bottom layer on an upper surface of the substrate, the bottom layer comprising grains having a first average grain size; depositing a catalyst layer on an upper surface of the bottom layer, the catalyst layer comprising grains having a second average grain size different from the first average grain size, thereby forming a stack of layers comprising the bottom layer and the catalyst layer; heating the stack of layers to a temperature where nanostructures can form; and providing a gas comprising a reactant such that the reactant comes into contact with the catalyst layer.
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