Smoltek can today show a capac­i­tor pro­to­type that is only a few microm­e­ters high and togeth­er with the nec­es­sary sub­strate (com­po­nent car­ri­er) bare­ly reach­es 40 microm­e­ters in total height. This at the same time as one can show a capac­i­tance den­si­ty of 500nF/​mm2 (nano­farad per square mil­lime­ter), an equiv­a­lent series resis­tance below 10 mΩ (mil­liohm) and an inter­nal induc­tance below 15 pH (pico­hen­ry).

“We have always known that our capac­i­tor tech­nol­o­gy enables extreme­ly thin capac­i­tor com­po­nents, but see­ing is believ­ing. Being able to show this high-per­for­mance pro­to­type helps a lot in our work in sell­ing the tech­nol­o­gy,” says Ola Tiver­man, Pres­i­dent of Smoltek Semi.

The need for thin­ner high-per­for­mance capac­i­tors for advanced semi­con­duc­tor inte­gra­tion will con­tin­ue to grow with new gen­er­a­tions of proces­sors, not least for 5G applications.

“Such a thin capac­i­tor proof-of con­cept that at the same time shows excel­lent per­for­mance is a result of Smoltek’s own R&D efforts. This also demon­strates the scal­a­bil­i­ty of our CNF-MIM tech­nol­o­gy and the applic­a­bil­i­ty of the tech­nol­o­gy for use in cut­ting-edge appli­ca­tions. And not least, the unique advan­tage that CNF-MIM pro­vides com­pared to com­pet­ing tech­nol­o­gy by meet­ing the need for increas­ing­ly thin­ner capac­i­tors with high per­for­mance even in the longer term,” says Vin­cent Des­maris, Chief Tech­nol­o­gy Offi­cer at Smoltek.

Based in Gothen­burg – Chal­leng­ing the glob­al semi­con­duc­tor industry

Smoltek, in Gothen­burg, Swe­den, has since the start devel­oped a num­ber of appli­ca­tion con­cepts, based on the company’s unique and patent-pro­tect­ed car­bon nan­otech­nol­o­gy plat­form, aimed towards the glob­al semi­con­duc­tor industry.

Since 2017, when the indus­try first began to show a clear inter­est in Smoltek’s capac­i­tor tech­nol­o­gy in par­tic­u­lar, the company’s tech­nol­o­gy devel­op­ment has been direct­ed with the aim of mak­ing these micro­scop­i­cal­ly small capac­i­tors even small­er, while main­tain­ing per­for­mance with­in impor­tant para­me­ters; such as high capac­i­tance den­si­ty, low leak­age cur­rent, low equiv­a­lent series resis­tance and low inductance.

With this demon­stra­tion of the oppor­tu­ni­ties with Smoltek’s CNF-MIM tech­nol­o­gy, the com­pa­ny chal­lenges the major play­ers in the semi­con­duc­tor indus­try about who has the tech­nol­o­gy to man­u­fac­ture the thinnest capac­i­tors in a com­pa­ra­ble per­for­mance segment.

Link to press release on Cision News